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Photoelectrochemical fabrication of spectroscopic diffraction gratings, phase 2This program was directed toward the production of Echelle diffraction gratings by a light-driven, electrochemical etching technique (photoelectrochemical etching). Etching is carried out in single crystal materials, and the differential rate of etching of the different crystallographic planes used to define the groove profiles. Etching of V-groove profiles was first discovered by us during the first phase of this project, which was initially conceived as a general exploration of photoelectrochemical etching techniques for grating fabrication. This highly controllable V-groove etching process was considered to be of high significance for producing low pitch Echelles, and provided the basis for a more extensive Phase 2 investigation.
Document ID
19930006503
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Rauh, R. David (EIC, Inc. Norwood, MA, United States)
Carrabba, Michael M. (EIC, Inc. Norwood, MA, United States)
Li, Jianguo (EIC, Inc. Norwood, MA, United States)
Cartland, Robert F. (EIC, Inc. Norwood, MA, United States)
Hachey, John P. (EIC, Inc. Norwood, MA, United States)
Mathew, Sam (EIC, Inc. Norwood, MA, United States)
Date Acquired
September 6, 2013
Publication Date
February 1, 1990
Subject Category
Optics
Report/Patent Number
NAS 1.26:190875
NASA-CR-190875
Accession Number
93N15692
Funding Number(s)
CONTRACT_GRANT: SBIR-08.01-9450
CONTRACT_GRANT: NAS5-30086
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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