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The Effect of Interface Roughness and Oxide Film Thickness on the Inelastic Response of Thermal Barrier Coatings to Thermal CyclingThe effects of interfacial roughness and oxide film thickness on thermally-induced stresses in plasma-sprayed thermal barrier coatings subjected to thermal cycling are investigated using the recently developed higher-order theory for functionally graded materials. The higher-order theory is shown to be a viable alternative to the finite-element approach, capable of modeling different interfacial roughness architectures in the presence of an aluminum oxide layer and capturing the high stress gradients that occur at the top coat/bond coat interface. The oxide layer thickness is demonstrated to have a substantially greater effect on the evolution of residual stresses than local variations in interfacial roughness. Further, the location of delamination initiation in the top coat is predicted to change with increasing oxide layer thickness. This result can be used to optimize the thickness of a pre-oxidized layer introduced at the top coat/bond coat interface in order to enhance TBC durability as suggested by some researchers. The results of our investigation also support a recently proposed hypothesis regarding delamination initiation and propagation in the presence of an evolving bond coat oxidation, while pointing to the importance of interfacial roughness details and specimen geometry in modeling this phenomenon.
Document ID
20000021226
Acquisition Source
Glenn Research Center
Document Type
Technical Memorandum (TM)
Authors
Pindera, Marek-Jerzy
(Virginia Univ. Charlottesville, VA United States)
Aboudi, Jacob
(Tel-Aviv Univ., Ramat-Aviv Tel-Aviv, Israel)
Arnold, Steven M.
(NASA Glenn Research Center Cleveland, OH United States)
Date Acquired
September 7, 2013
Publication Date
December 1, 1999
Subject Category
Nonmetallic Materials
Report/Patent Number
E-12026
NASA/TM-1999-209770
NAS 1.15:209770
Funding Number(s)
CONTRACT_GRANT: NAG3-2252
PROJECT: RTOP 523-31-13
CONTRACT_GRANT: NAG3-1377
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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