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A numerical and experimental analysis of reactor performance and deposition rates for CVD on monofilamentsThe computational fluid dynamics (CFD) code FLUENT is adopted to simulate a cylindrical upflow reactor designed for chemical vapor deposition (CVD) on monofilaments. Equilibrium temperature profiles along the fiber and quartz reactor wall are experimentally measured and used as boundary conditions in numerical simulations. Two-dimensional axisymmetric flow and temperature fields are calculated for hydrogen and argon; the effect of free convection is assessed. The gas and surface chemistry is included for predicting silicon deposition from silane. The model predictions are compared with experimentally measured silicon CVD rates. Inferences are made for optimum conditions to obtain uniformity.
Document ID
19910005187
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Gokoglu, S. A. (NASA Lewis Research Center Cleveland, OH., United States)
Kuczmarski, M. (NASA Lewis Research Center Cleveland, OH., United States)
Veitch, L. (NASA Lewis Research Center Cleveland, OH., United States)
Tsui, P. (Sverdrup Technology, Inc., Brook Park OH., United States)
Chait, A. (NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
September 6, 2013
Publication Date
January 1, 1990
Subject Category
Engineering (General)
Report/Patent Number
E-5801
NASA-TM-103631
NAS 1.15:103631
Meeting Information
Meeting: International Conference on Chemical Vapor Deposition
Location: Seattle, WA
Country: United States
Start Date: October 14, 1990
End Date: October 19, 1990
Sponsors: Electrochemical Society
Accession Number
91N14500
Funding Number(s)
CONTRACT_GRANT: NAS3-25266
PROJECT: RTOP 510-01-01
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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